Abstract
Nucleation and growth of highly crystalline silicon nanoparticles in atmospheric-pressure low-temperature microplasmas at gas temperatures well below the Si crystallization threshold and within a short (100 μs) period of time are demonstrated and explained. The modeling reveals that collision-enhanced ion fluxes can effectively increase the heat flux on the nanoparticle surface and this heating is controlled by the ion density. It is shown that nanoparticles can be heated to temperatures above the crystallization threshold. These combined experimental and theoretical results confirm the effective heating and structure control of Si nanoparticles at atmospheric pressure and low gas temperatures.
Original language | English |
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Article number | 163103 |
Journal | Applied Physics Letters |
Volume | 104 |
Issue number | 16 |
DOIs | |
Publication status | Published - 21 Apr 2014 |
Keywords
- electron density
- physical quantities
- thermodynamic states and processes
- Stark effect
- Nanoparticle
- leptons
- silicon compounds
- chemical elements
- plasmas
- fluid mechancis