Crystalline Si nanoparticles below crystallization threshold: effects of collisional heating in non-thermal atmospheric-pressure microplasmas

S. Askari*, I. Levchenko, K. Ostrikov, P. Maguire, D. Mariotti

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

68 Citations (Scopus)

Abstract

Nucleation and growth of highly crystalline silicon nanoparticles in atmospheric-pressure low-temperature microplasmas at gas temperatures well below the Si crystallization threshold and within a short (100 μs) period of time are demonstrated and explained. The modeling reveals that collision-enhanced ion fluxes can effectively increase the heat flux on the nanoparticle surface and this heating is controlled by the ion density. It is shown that nanoparticles can be heated to temperatures above the crystallization threshold. These combined experimental and theoretical results confirm the effective heating and structure control of Si nanoparticles at atmospheric pressure and low gas temperatures.

Original languageEnglish
Article number163103
JournalApplied Physics Letters
Volume104
Issue number16
DOIs
Publication statusPublished - 21 Apr 2014

Keywords

  • electron density
  • physical quantities
  • thermodynamic states and processes
  • Stark effect
  • Nanoparticle
  • leptons
  • silicon compounds
  • chemical elements
  • plasmas
  • fluid mechancis

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