Control of edge bulge evolution during photoresist reflow and it's application to diamond micro-lens fabrication

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Abstract

We present an empirical study of profile evolution of lithographically defined photoresist (PR) patterns during thermal reflow and apply the findings to diamond micro-lens fabrication. During PR reflow, a bulge forms at the edge of the PR pattern and propagates inwards as the temperature and PR thickness are increased. An empirical relationship for this propagation is derived. Furthermore, it was found that at a certain reflow temperature and a limited pattern size, there is a minimum initial thickness of the PR pattern for forming spherical lens profiles. Based on these findings, diamond micro-lenses with a diameter of 400 µm and a previously unachieved radius of curvature of over 13 mm were fabricated. This is underpinned by forming PR micro-lens patterns with a large radius of curvature and transferring the PR patterns through low-selectivity Ar/Cl2 inductively coupled plasma etching.
Original languageEnglish
Article number021602
Number of pages6
JournalJournal of Vacuum Science and Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Volume34
Issue number2
DOIs
Publication statusPublished - 9 Mar 2016

Keywords

  • photoresist patterns
  • thermal reflow
  • diamond micro-lens
  • micro-lens fabrication

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