Compact semiconductor tapers for deep-to-shallow etch transitions

M.J. Strain, M. Sorel

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Double-etched taper devices for application as mode converters between shallow and deep-etched waveguides are presented with particular attention paid to the derivation of the taper profile. Finite-difference time-domain simulations of the devices are carried out and compared with fabricated devices along with a transfer matrix method representation that confirms the extraction of values for reflectivity from the transmission spectra of the devices. Tapers of sub-100-mum lengths are shown to exhibit losses of <0.5 dB and reflectivities of <0.05%.
Original languageEnglish
Pages (from-to)1544-1546
Number of pages3
JournalIEEE Photonics Technology Letters
Volume19
Issue number19
DOIs
Publication statusPublished - 1 Oct 2007

Keywords

  • photonics
  • integrated optics
  • optical waveguides
  • refractive index
  • shallow etched waveguides

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