Abstract
Structural information available from the granulometry of an image has been used widely in image texture analysis and classification. In this paper we present a method for classifying texture images which follow an intrinsic ordering
of textures, using polynomial regression to express granulometric moments as a function of class label. Separate models are built for each individual moment and combined for back-prediction of the class label of a new image. The methodology was developed on synthetic images of evolving textures and tested using real images of 8 different grades of cut-tear-curl black tea leaves.
For comparison, grey level co-occurrence (GLCM) based features were also computed, and both feature types were used in a range of classifiers including the regression approach. Experimental results demonstrate the superiority of the granulometric moments over GLCM-based features for classifying these tea images.
of textures, using polynomial regression to express granulometric moments as a function of class label. Separate models are built for each individual moment and combined for back-prediction of the class label of a new image. The methodology was developed on synthetic images of evolving textures and tested using real images of 8 different grades of cut-tear-curl black tea leaves.
For comparison, grey level co-occurrence (GLCM) based features were also computed, and both feature types were used in a range of classifiers including the regression approach. Experimental results demonstrate the superiority of the granulometric moments over GLCM-based features for classifying these tea images.
Original language | English |
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Pages | 70-75 |
Number of pages | 6 |
DOIs | |
Publication status | Published - 9 Sept 2011 |
Event | Irish Machine Vision and Image Processing Conference - Dublin, Ireland Duration: 8 Sept 2011 → 9 Sept 2011 |
Conference
Conference | Irish Machine Vision and Image Processing Conference |
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Country/Territory | Ireland |
City | Dublin |
Period | 8/09/11 → 9/09/11 |
Keywords
- granulometry
- structuring
- pattern spectrum