Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope

Mohammed Shahzad, Lewis R. Reid, Roman Spesyvtsev, Antoine Maitrallain, George K. Holt, Wentao Li, Gregory Vieux, Enrico Brunetti, S. Mark Wiggins, Giancarlo Gatti, D De Luis, Luca Volpe, Robert Fedosejevs, Dino A. Jaroszynski

Research output: Chapter in Book/Report/Conference proceedingConference contribution book

Abstract

Laser plasma accelerators are highly versatile and are sources of both radiation and particle beams, with unique properties. The Scottish Centre for Application based Plasma Accelerators (SCAPA) 40 TW and 350 TW laser at the University of Strathclyde has been used to produce both soft and hard x-rays using a laser wakefield accelerator (LWFA). The inherent characteristics of these femtosecond duration pulsed x-rays make them ideal for probing matter and ultrafast imaging applications. To support the development of applications of laser plasma accelerators at the SCAPA facility an adjustable Kirkpatrick-Baez x-ray microscope has been designed to focus 50 eV - 10 KeV x-rays. It is now possible to produce high quality at silicon wafers substrates that can be used for x-ray optics. Platinum-coated (40 nm) silicon wafers have been used in the KB instrument to image the LWFA x-ray source. We simulate the source distribution as part of an investigation to determine the x-ray source size and therefore its transverse coherence and ultimately the peak brilliance. The OASYS SHAODOW-OUI raytracing and wave propagation code has been used to simulate the imaging setup and determine instrument resolution.

LanguageEnglish
Title of host publicationSPIE Optics + Optoelectronics
EditorsMinSup Hur, Dino A. Jaroszynski
Place of PublicationBellingham, W.A.
Number of pages7
Volume11036
ISBN (Electronic)9781510627383
DOIs
Publication statusPublished - 4 Apr 2019

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plasma accelerators
x ray sources
laser plasmas
microscopes
accelerators
x rays
wafers
x ray optics
lasers
particle beams
silicon
wave propagation
platinum
propagation

Keywords

  • laser plasma accelerator
  • Kirkpatrick-Baez microscope

Cite this

Shahzad, Mohammed ; Reid, Lewis R. ; Spesyvtsev, Roman ; Maitrallain, Antoine ; Holt, George K. ; Li, Wentao ; Vieux, Gregory ; Brunetti, Enrico ; Wiggins, S. Mark ; Gatti, Giancarlo ; Luis, D De ; Volpe, Luca ; Fedosejevs, Robert ; Jaroszynski, Dino A. / Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope. SPIE Optics + Optoelectronics. editor / MinSup Hur ; Dino A. Jaroszynski. Vol. 11036 Bellingham, W.A., 2019.
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title = "Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope",
abstract = "Laser plasma accelerators are highly versatile and are sources of both radiation and particle beams, with unique properties. The Scottish Centre for Application based Plasma Accelerators (SCAPA) 40 TW and 350 TW laser at the University of Strathclyde has been used to produce both soft and hard x-rays using a laser wakefield accelerator (LWFA). The inherent characteristics of these femtosecond duration pulsed x-rays make them ideal for probing matter and ultrafast imaging applications. To support the development of applications of laser plasma accelerators at the SCAPA facility an adjustable Kirkpatrick-Baez x-ray microscope has been designed to focus 50 eV - 10 KeV x-rays. It is now possible to produce high quality at silicon wafers substrates that can be used for x-ray optics. Platinum-coated (40 nm) silicon wafers have been used in the KB instrument to image the LWFA x-ray source. We simulate the source distribution as part of an investigation to determine the x-ray source size and therefore its transverse coherence and ultimately the peak brilliance. The OASYS SHAODOW-OUI raytracing and wave propagation code has been used to simulate the imaging setup and determine instrument resolution.",
keywords = "laser plasma accelerator, Kirkpatrick-Baez microscope",
author = "Mohammed Shahzad and Reid, {Lewis R.} and Roman Spesyvtsev and Antoine Maitrallain and Holt, {George K.} and Wentao Li and Gregory Vieux and Enrico Brunetti and Wiggins, {S. Mark} and Giancarlo Gatti and Luis, {D De} and Luca Volpe and Robert Fedosejevs and Jaroszynski, {Dino A.}",
note = "Copyright 2019 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited.",
year = "2019",
month = "4",
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doi = "10.1117/12.2522778",
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Shahzad, M, Reid, LR, Spesyvtsev, R, Maitrallain, A, Holt, GK, Li, W, Vieux, G, Brunetti, E, Wiggins, SM, Gatti, G, Luis, DD, Volpe, L, Fedosejevs, R & Jaroszynski, DA 2019, Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope. in M Hur & DA Jaroszynski (eds), SPIE Optics + Optoelectronics. vol. 11036, 110360Q, Bellingham, W.A. https://doi.org/10.1117/12.2522778

Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope. / Shahzad, Mohammed; Reid, Lewis R.; Spesyvtsev, Roman; Maitrallain, Antoine; Holt, George K.; Li, Wentao; Vieux, Gregory; Brunetti, Enrico; Wiggins, S. Mark; Gatti, Giancarlo; Luis, D De; Volpe, Luca ; Fedosejevs, Robert; Jaroszynski, Dino A.

SPIE Optics + Optoelectronics. ed. / MinSup Hur; Dino A. Jaroszynski. Vol. 11036 Bellingham, W.A., 2019. 110360Q.

Research output: Chapter in Book/Report/Conference proceedingConference contribution book

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AU - Spesyvtsev, Roman

AU - Maitrallain, Antoine

AU - Holt, George K.

AU - Li, Wentao

AU - Vieux, Gregory

AU - Brunetti, Enrico

AU - Wiggins, S. Mark

AU - Gatti, Giancarlo

AU - Luis, D De

AU - Volpe, Luca

AU - Fedosejevs, Robert

AU - Jaroszynski, Dino A.

N1 - Copyright 2019 Society of Photo‑Optical Instrumentation Engineers (SPIE). One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this publication for a fee or for commercial purposes, and modification of the contents of the publication are prohibited.

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N2 - Laser plasma accelerators are highly versatile and are sources of both radiation and particle beams, with unique properties. The Scottish Centre for Application based Plasma Accelerators (SCAPA) 40 TW and 350 TW laser at the University of Strathclyde has been used to produce both soft and hard x-rays using a laser wakefield accelerator (LWFA). The inherent characteristics of these femtosecond duration pulsed x-rays make them ideal for probing matter and ultrafast imaging applications. To support the development of applications of laser plasma accelerators at the SCAPA facility an adjustable Kirkpatrick-Baez x-ray microscope has been designed to focus 50 eV - 10 KeV x-rays. It is now possible to produce high quality at silicon wafers substrates that can be used for x-ray optics. Platinum-coated (40 nm) silicon wafers have been used in the KB instrument to image the LWFA x-ray source. We simulate the source distribution as part of an investigation to determine the x-ray source size and therefore its transverse coherence and ultimately the peak brilliance. The OASYS SHAODOW-OUI raytracing and wave propagation code has been used to simulate the imaging setup and determine instrument resolution.

AB - Laser plasma accelerators are highly versatile and are sources of both radiation and particle beams, with unique properties. The Scottish Centre for Application based Plasma Accelerators (SCAPA) 40 TW and 350 TW laser at the University of Strathclyde has been used to produce both soft and hard x-rays using a laser wakefield accelerator (LWFA). The inherent characteristics of these femtosecond duration pulsed x-rays make them ideal for probing matter and ultrafast imaging applications. To support the development of applications of laser plasma accelerators at the SCAPA facility an adjustable Kirkpatrick-Baez x-ray microscope has been designed to focus 50 eV - 10 KeV x-rays. It is now possible to produce high quality at silicon wafers substrates that can be used for x-ray optics. Platinum-coated (40 nm) silicon wafers have been used in the KB instrument to image the LWFA x-ray source. We simulate the source distribution as part of an investigation to determine the x-ray source size and therefore its transverse coherence and ultimately the peak brilliance. The OASYS SHAODOW-OUI raytracing and wave propagation code has been used to simulate the imaging setup and determine instrument resolution.

KW - laser plasma accelerator

KW - Kirkpatrick-Baez microscope

UR - https://spie.org/conferences-and-exhibitions/optics-and-optoelectronics/conferences

U2 - 10.1117/12.2522778

DO - 10.1117/12.2522778

M3 - Conference contribution book

VL - 11036

BT - SPIE Optics + Optoelectronics

A2 - Hur, MinSup

A2 - Jaroszynski, Dino A.

CY - Bellingham, W.A.

ER -

Shahzad M, Reid LR, Spesyvtsev R, Maitrallain A, Holt GK, Li W et al. Characterisation of a laser plasma accelerator x-ray source size using a Kirkpatrick-Baez microscope. In Hur M, Jaroszynski DA, editors, SPIE Optics + Optoelectronics. Vol. 11036. Bellingham, W.A. 2019. 110360Q https://doi.org/10.1117/12.2522778