Abstract
We report on the use of silicon nanocrystals (Si-ncs) to activate nucleation and growth of carbon nanotubes (CNTs) without using any metal catalyst. Si-ncs with different surface characteristics have been exposed to the same CH4 low-pressure plasma treatment producing quite different results. Specifically, Si-ncs prepared by laser ablation in water have contributed to the formation of micrometre-sized silicon spherical particles. On the other hand, Si-ncs prepared by electrochemical etching did not induce any specific growth while the third type of Si-ncs, prepared by electrochemical etching and treated by a laser fragmentation process, induced the growth of multi-walled CNTs. The different outcomes of the same plasma process are attributed to the diverse surface features presented by the Si-ncs.
Original language | English |
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Article number | 122001 |
Number of pages | 5 |
Journal | Journal of Physics D: Applied Physics |
Volume | 46 |
Issue number | 12 |
Early online date | 18 Feb 2013 |
DOIs | |
Publication status | Published - 27 Mar 2013 |
Keywords
- carbon nanotubes
- electrochemical etching
- plasma applications