Automated alignment in mask-free photolithography enabled by micro-LED arrays

M. Stonehouse, A. Blanchard, B. Guilhabert, Y. Zhang, E. Gu, I. M. Watson, J. Herrnsdorf, M. D. Dawson

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)
73 Downloads (Pure)

Abstract

We present an automated control system for positioning on the micro scale, based on the principles of single pixel imaging and fluorescence. By using the projected output of a chequerboard array of CMOS controllable μ-LEDs at a suitable wavelength, we are able to spatially locate, track and automatically align to fluorescent markers. Using this system, positioning is demonstrated with accuracy on the order of 20 μm. We present a maskless photo-lithography system using the automated control capability and a second μ-LED array to photo-cure customisable structures in photoresist with alignment referenced to the fluorescent markers.
Original languageEnglish
Pages (from-to)721-723
Number of pages3
JournalElectronics Letters
Volume57
Issue number19
Early online date31 May 2021
DOIs
Publication statusE-pub ahead of print - 31 May 2021

Keywords

  • automated
  • alignment
  • mask-free photolithography
  • micro-LED arrays

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