Automated alignment in mask-free photolithography enabled by micro-LED arrays

M. Stonehouse; A. Blanchard; B. Guilhabert; Y. Zhang; E. Gu; I. M. Watson; J. Herrnsdorf; M. D. Dawson

doi:10.1049/ell2.12244

Automated alignment in mask-free photolithography enabled by micro-LED arrays

M. Stonehouse, A. Blanchard, B. Guilhabert, Y. Zhang, E. Gu, I. M. Watson, J. Herrnsdorf, M. D. Dawson

Institute Of Photonics

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Abstract

We present an automated control system for positioning on the micro scale, based on the principles of single pixel imaging and fluorescence. By using the projected output of a chequerboard array of CMOS controllable μ-LEDs at a suitable wavelength, we are able to spatially locate, track and automatically align to fluorescent markers. Using this system, positioning is demonstrated with accuracy on the order of 20 μm. We present a maskless photo-lithography system using the automated control capability and a second μ-LED array to photo-cure customisable structures in photoresist with alignment referenced to the fluorescent markers.

Original language	English
Pages (from-to)	721-723
Number of pages	3
Journal	Electronics Letters
Volume	57
Issue number	19
Early online date	31 May 2021
DOIs	https://doi.org/10.1049/ell2.12244
Publication status	E-pub ahead of print - 31 May 2021

Keywords

automated
alignment
mask-free photolithography
micro-LED arrays

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10.1049/ell2.12244Licence: CC BY 4.0

Stonehouse-etal-EL-2021-Automated-alignment-in-mask-free-photolithographyFinal published version, 0.99 MBLicence: CC BY 4.0

Data for: "Automated Alignment in Mask-Free Photolithography Enabled by Micro-LED Arrays"
Blanchard, A. (Owner), Stonehouse, M. (Creator), Watson, I. (Contributor), Herrnsdorf, J. (Supervisor), Dawson, M. (Supervisor), Gu, E. (Supervisor), Guilhabert, B. J. E. (Contributor) & Zhang, Y. (Creator), University of Strathclyde, 24 May 2021
DOI: 10.15129/8001a316-d1e8-4158-b90b-d24193f41535
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title = "Automated alignment in mask-free photolithography enabled by micro-LED arrays",

abstract = "We present an automated control system for positioning on the micro scale, based on the principles of single pixel imaging and fluorescence. By using the projected output of a chequerboard array of CMOS controllable μ-LEDs at a suitable wavelength, we are able to spatially locate, track and automatically align to fluorescent markers. Using this system, positioning is demonstrated with accuracy on the order of 20 μm. We present a maskless photo-lithography system using the automated control capability and a second μ-LED array to photo-cure customisable structures in photoresist with alignment referenced to the fluorescent markers.",

keywords = "automated, alignment, mask-free photolithography, micro-LED arrays",

author = "M. Stonehouse and A. Blanchard and B. Guilhabert and Y. Zhang and E. Gu and Watson, {I. M.} and J. Herrnsdorf and Dawson, {M. D.}",

year = "2021",

month = may,

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doi = "10.1049/ell2.12244",

language = "English",

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T1 - Automated alignment in mask-free photolithography enabled by micro-LED arrays

AU - Stonehouse, M.

AU - Blanchard, A.

AU - Guilhabert, B.

AU - Zhang, Y.

AU - Gu, E.

AU - Watson, I. M.

AU - Herrnsdorf, J.

AU - Dawson, M. D.

PY - 2021/5/31

Y1 - 2021/5/31

N2 - We present an automated control system for positioning on the micro scale, based on the principles of single pixel imaging and fluorescence. By using the projected output of a chequerboard array of CMOS controllable μ-LEDs at a suitable wavelength, we are able to spatially locate, track and automatically align to fluorescent markers. Using this system, positioning is demonstrated with accuracy on the order of 20 μm. We present a maskless photo-lithography system using the automated control capability and a second μ-LED array to photo-cure customisable structures in photoresist with alignment referenced to the fluorescent markers.

AB - We present an automated control system for positioning on the micro scale, based on the principles of single pixel imaging and fluorescence. By using the projected output of a chequerboard array of CMOS controllable μ-LEDs at a suitable wavelength, we are able to spatially locate, track and automatically align to fluorescent markers. Using this system, positioning is demonstrated with accuracy on the order of 20 μm. We present a maskless photo-lithography system using the automated control capability and a second μ-LED array to photo-cure customisable structures in photoresist with alignment referenced to the fluorescent markers.

KW - automated

KW - alignment

KW - mask-free photolithography

KW - micro-LED arrays

U2 - 10.1049/ell2.12244

DO - 10.1049/ell2.12244

M3 - Article

VL - 57

SP - 721

EP - 723

JO - Electronics Letters

JF - Electronics Letters

SN - 0013-5194

IS - 19

ER -

Automated alignment in mask-free photolithography enabled by micro-LED arrays

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Keywords

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Data for: "Automated Alignment in Mask-Free Photolithography Enabled by Micro-LED Arrays"

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