Projects per year
Abstract
Original language | English |
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Article number | 157253 |
Number of pages | 9 |
Journal | Applied Surface Science |
Volume | 626 |
Early online date | 15 Apr 2023 |
DOIs | |
Publication status | Published - 30 Jul 2023 |
Keywords
- nanolithography
- ReaxFF MD
- bias-induced oxidation
- chemical composition
- silicon
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Dive into the research topics of 'Atomistic insights into bias-induced oxidation on passivated silicon surface through ReaxFF MD simulation'. Together they form a unique fingerprint.-
A hybrid precision manufacturing platform for next-generation of nanoscale products
Luo, X. (Principal Investigator) & Watson, I. (Co-investigator)
EPSRC (Engineering and Physical Sciences Research Council)
1/07/21 → 14/11/25
Project: Research
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A Multiscale Digital Twin-Driven Smart Manufacturing System for High Value-Added Products
Luo, X. (Principal Investigator), Qin, Y. (Co-investigator) & Ward, M. (Co-investigator)
EPSRC (Engineering and Physical Sciences Research Council)
1/05/20 → 30/04/25
Project: Research
-
Towards determinstic atomic scale manufacturing of next-generation quantum devices
Luo, X. (Principal Investigator) & Xie, W. (Co-investigator)
EPSRC (Engineering and Physical Sciences Research Council)
1/01/23 → 31/12/24
Project: Research Fellowship
Datasets
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Data for: "Atomistic insights into bias-induced oxidation on passivated silicon surface through ReaxFF MD simulation"
Gao, J. (Creator) & Luo, X. (Supervisor), University of Strathclyde, 19 Apr 2023
DOI: 10.15129/773fb2bc-7a7e-49de-96e5-04b55251f2db
Dataset