Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

S.A. O'Neill, I.P. Parkin, R.J.H. Clark, N. Elliott, A. Mills

Research output: Contribution to journalArticlepeer-review

77 Citations (Scopus)

Abstract

Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass substrates was achieved by the reaction of TiCl4 and a co-oxygen source (MeOH, EtOH, (PrOH)-Pr-i or H2O) at 500-650degreesC. The coatings show excellent uniformity, surface coverage and adherence. Growth rates were of the order of 0.3 mum min(-1) at 500degreesC. All films are crystalline and single phase with XRD showing the anatase TiO2 diffraction pattern; a = 3.78(1), c = 9.51(1) Angstrom. Optically, the films show minimal reflectivity from 300-1600 nm and 50-80% total transmission from 300-800 nm. Contact angles are in the range 20-40degrees for as-prepared films and 1-10degrees after 30 min irradiation at 254 nm. All of the films show significant photocatalyic activity as regards the destruction of an overlayer of stearic acid.
Original languageEnglish
Pages (from-to)56-60
Number of pages4
JournalJournal of Materials Chemistry
Volume13
Issue number1
DOIs
Publication statusPublished - 2003

Keywords

  • TIO2 THIN-FILMS
  • PHOTOCATALYTIC OXIDATION
  • SURFACES
  • ANATASE
  • GROWTH
  • REACTOR
  • LIQUID
  • ACID

Fingerprint

Dive into the research topics of 'Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass'. Together they form a unique fingerprint.

Cite this