Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

S.A. O'Neill; I.P. Parkin; R.J.H. Clark; N. Elliott; A. Mills

doi:10.1039/b206080a

Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

S.A. O'Neill, I.P. Parkin, R.J.H. Clark, N. Elliott, A. Mills

Pure And Applied Chemistry

Research output: Contribution to journal › Article › peer-review

77 Citations (Scopus)

Abstract

Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass substrates was achieved by the reaction of TiCl4 and a co-oxygen source (MeOH, EtOH, (PrOH)-Pr-i or H2O) at 500-650degreesC. The coatings show excellent uniformity, surface coverage and adherence. Growth rates were of the order of 0.3 mum min(-1) at 500degreesC. All films are crystalline and single phase with XRD showing the anatase TiO2 diffraction pattern; a = 3.78(1), c = 9.51(1) Angstrom. Optically, the films show minimal reflectivity from 300-1600 nm and 50-80% total transmission from 300-800 nm. Contact angles are in the range 20-40degrees for as-prepared films and 1-10degrees after 30 min irradiation at 254 nm. All of the films show significant photocatalyic activity as regards the destruction of an overlayer of stearic acid.

Original language	English
Pages (from-to)	56-60
Number of pages	4
Journal	Journal of Materials Chemistry
Volume	13
Issue number	1
DOIs	https://doi.org/10.1039/b206080a
Publication status	Published - 2003

Keywords

TIO2 THIN-FILMS
PHOTOCATALYTIC OXIDATION
SURFACES
ANATASE
GROWTH
REACTOR
LIQUID
ACID

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@article{fdf55efe95974329b34f3ea82c55273c,

title = "Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass",

abstract = "Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass substrates was achieved by the reaction of TiCl4 and a co-oxygen source (MeOH, EtOH, (PrOH)-Pr-i or H2O) at 500-650degreesC. The coatings show excellent uniformity, surface coverage and adherence. Growth rates were of the order of 0.3 mum min(-1) at 500degreesC. All films are crystalline and single phase with XRD showing the anatase TiO2 diffraction pattern; a = 3.78(1), c = 9.51(1) Angstrom. Optically, the films show minimal reflectivity from 300-1600 nm and 50-80% total transmission from 300-800 nm. Contact angles are in the range 20-40degrees for as-prepared films and 1-10degrees after 30 min irradiation at 254 nm. All of the films show significant photocatalyic activity as regards the destruction of an overlayer of stearic acid.",

keywords = "TIO2 THIN-FILMS, PHOTOCATALYTIC OXIDATION, SURFACES, ANATASE, GROWTH, REACTOR, LIQUID, ACID",

author = "S.A. O'Neill and I.P. Parkin and R.J.H. Clark and N. Elliott and A. Mills",

year = "2003",

doi = "10.1039/b206080a",

language = "English",

volume = "13",

pages = "56--60",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

publisher = "Royal Society of Chemistry",

number = "1",

}

TY - JOUR

T1 - Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

AU - O'Neill, S.A.

AU - Parkin, I.P.

AU - Clark, R.J.H.

AU - Elliott, N.

AU - Mills, A.

PY - 2003

Y1 - 2003

N2 - Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass substrates was achieved by the reaction of TiCl4 and a co-oxygen source (MeOH, EtOH, (PrOH)-Pr-i or H2O) at 500-650degreesC. The coatings show excellent uniformity, surface coverage and adherence. Growth rates were of the order of 0.3 mum min(-1) at 500degreesC. All films are crystalline and single phase with XRD showing the anatase TiO2 diffraction pattern; a = 3.78(1), c = 9.51(1) Angstrom. Optically, the films show minimal reflectivity from 300-1600 nm and 50-80% total transmission from 300-800 nm. Contact angles are in the range 20-40degrees for as-prepared films and 1-10degrees after 30 min irradiation at 254 nm. All of the films show significant photocatalyic activity as regards the destruction of an overlayer of stearic acid.

AB - Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass substrates was achieved by the reaction of TiCl4 and a co-oxygen source (MeOH, EtOH, (PrOH)-Pr-i or H2O) at 500-650degreesC. The coatings show excellent uniformity, surface coverage and adherence. Growth rates were of the order of 0.3 mum min(-1) at 500degreesC. All films are crystalline and single phase with XRD showing the anatase TiO2 diffraction pattern; a = 3.78(1), c = 9.51(1) Angstrom. Optically, the films show minimal reflectivity from 300-1600 nm and 50-80% total transmission from 300-800 nm. Contact angles are in the range 20-40degrees for as-prepared films and 1-10degrees after 30 min irradiation at 254 nm. All of the films show significant photocatalyic activity as regards the destruction of an overlayer of stearic acid.

KW - TIO2 THIN-FILMS

KW - PHOTOCATALYTIC OXIDATION

KW - SURFACES

KW - ANATASE

KW - GROWTH

KW - REACTOR

KW - LIQUID

KW - ACID

UR - http://www.rsc.org/delivery/_ArticleLinking/DisplayArticleForFree.cfm?doi=b206080a&JournalCode=JM

U2 - 10.1039/b206080a

DO - 10.1039/b206080a

M3 - Article

SN - 0959-9428

VL - 13

SP - 56

EP - 60

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

IS - 1

ER -

Atmospheric pressure chemical vapour deposition of titanium dioxide coatings on glass

Abstract

Keywords

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