Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

S.A. O'Neill; I.P. Parkin; R.J.H. Clark; A. Mills; N. Elliott

doi:10.1039/b307768n

Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

S.A. O'Neill, I.P. Parkin, R.J.H. Clark, A. Mills, N. Elliott

Pure And Applied Chemistry

Research output: Contribution to journal › Article › peer-review

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Abstract

A novel route involving atmospheric pressure chemical vapour deposition (APCVD) is reported for coating Nb2O5 onto glass substrates via the reaction of NbCl5 and ethyl acetate at 400-660degreesC. Raman spectroscopy is shown to be a simple diagnostic tool for the analysis of these thin films. The contact angle of water on Nb2O5-coated glass drops on UV irradiation from 60degrees to 5-20degrees. XPS Analysis showed that the Nb:O ratio of the film was 1:2.5. Glancing angle X-ray diffraction showed that all films were crystalline, with only a single phase being observed; this has some preferred orientation in the (201) plane of Nb2O5. The niobium(V) oxide materials show minimal photocatalytic ability to degrade organic material.

Original language	English
Pages (from-to)	2952-2956
Number of pages	4
Journal	Journal of Materials Chemistry
Volume	13
Issue number	12
DOIs	https://doi.org/10.1039/b307768n
Publication status	Published - 2003

Keywords

NIOBIUM OXIDE CATALYSTS
SOL-GEL PROCESS
COATINGS
PRECURSORS
OXIDATION
TANTALUM
DEVICES
RAMAN

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title = "Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass",

abstract = "A novel route involving atmospheric pressure chemical vapour deposition (APCVD) is reported for coating Nb2O5 onto glass substrates via the reaction of NbCl5 and ethyl acetate at 400-660degreesC. Raman spectroscopy is shown to be a simple diagnostic tool for the analysis of these thin films. The contact angle of water on Nb2O5-coated glass drops on UV irradiation from 60degrees to 5-20degrees. XPS Analysis showed that the Nb:O ratio of the film was 1:2.5. Glancing angle X-ray diffraction showed that all films were crystalline, with only a single phase being observed; this has some preferred orientation in the (201) plane of Nb2O5. The niobium(V) oxide materials show minimal photocatalytic ability to degrade organic material.",

keywords = "NIOBIUM OXIDE CATALYSTS, SOL-GEL PROCESS, COATINGS, PRECURSORS, OXIDATION, TANTALUM, DEVICES, RAMAN",

author = "S.A. O'Neill and I.P. Parkin and R.J.H. Clark and A. Mills and N. Elliott",

year = "2003",

doi = "10.1039/b307768n",

language = "English",

volume = "13",

pages = "2952--2956",

journal = "Journal of Materials Chemistry",

issn = "0959-9428",

publisher = "Royal Society of Chemistry",

number = "12",

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TY - JOUR

T1 - Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

AU - O'Neill, S.A.

AU - Parkin, I.P.

AU - Clark, R.J.H.

AU - Mills, A.

AU - Elliott, N.

PY - 2003

Y1 - 2003

N2 - A novel route involving atmospheric pressure chemical vapour deposition (APCVD) is reported for coating Nb2O5 onto glass substrates via the reaction of NbCl5 and ethyl acetate at 400-660degreesC. Raman spectroscopy is shown to be a simple diagnostic tool for the analysis of these thin films. The contact angle of water on Nb2O5-coated glass drops on UV irradiation from 60degrees to 5-20degrees. XPS Analysis showed that the Nb:O ratio of the film was 1:2.5. Glancing angle X-ray diffraction showed that all films were crystalline, with only a single phase being observed; this has some preferred orientation in the (201) plane of Nb2O5. The niobium(V) oxide materials show minimal photocatalytic ability to degrade organic material.

AB - A novel route involving atmospheric pressure chemical vapour deposition (APCVD) is reported for coating Nb2O5 onto glass substrates via the reaction of NbCl5 and ethyl acetate at 400-660degreesC. Raman spectroscopy is shown to be a simple diagnostic tool for the analysis of these thin films. The contact angle of water on Nb2O5-coated glass drops on UV irradiation from 60degrees to 5-20degrees. XPS Analysis showed that the Nb:O ratio of the film was 1:2.5. Glancing angle X-ray diffraction showed that all films were crystalline, with only a single phase being observed; this has some preferred orientation in the (201) plane of Nb2O5. The niobium(V) oxide materials show minimal photocatalytic ability to degrade organic material.

KW - NIOBIUM OXIDE CATALYSTS

KW - SOL-GEL PROCESS

KW - COATINGS

KW - PRECURSORS

KW - OXIDATION

KW - TANTALUM

KW - DEVICES

KW - RAMAN

UR - http://www.rsc.org/Publishing/Journals/JM/article.asp?doi=b307768n

U2 - 10.1039/b307768n

DO - 10.1039/b307768n

M3 - Article

SN - 0959-9428

VL - 13

SP - 2952

EP - 2956

JO - Journal of Materials Chemistry

JF - Journal of Materials Chemistry

IS - 12

ER -

Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

Abstract

Keywords

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