Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass

S.A. O'Neill, I.P. Parkin, R.J.H. Clark, A. Mills, N. Elliott

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Abstract

A novel route involving atmospheric pressure chemical vapour deposition (APCVD) is reported for coating Nb2O5 onto glass substrates via the reaction of NbCl5 and ethyl acetate at 400-660degreesC. Raman spectroscopy is shown to be a simple diagnostic tool for the analysis of these thin films. The contact angle of water on Nb2O5-coated glass drops on UV irradiation from 60degrees to 5-20degrees. XPS Analysis showed that the Nb:O ratio of the film was 1:2.5. Glancing angle X-ray diffraction showed that all films were crystalline, with only a single phase being observed; this has some preferred orientation in the (201) plane of Nb2O5. The niobium(V) oxide materials show minimal photocatalytic ability to degrade organic material.
Original languageEnglish
Pages (from-to)2952-2956
Number of pages4
JournalJournal of Materials Chemistry
Volume13
Issue number12
DOIs
Publication statusPublished - 2003

Keywords

  • NIOBIUM OXIDE CATALYSTS
  • SOL-GEL PROCESS
  • COATINGS
  • PRECURSORS
  • OXIDATION
  • TANTALUM
  • DEVICES
  • RAMAN

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    O'Neill, S. A., Parkin, I. P., Clark, R. J. H., Mills, A., & Elliott, N. (2003). Atmospheric pressure chemical vapour deposition of thin films of Nb2O5 on glass. Journal of Materials Chemistry, 13(12), 2952-2956. https://doi.org/10.1039/b307768n