Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate

S.A. O'Neill; R.J.H. Clark; I.P. Parkin; N. Elliott; A. Mills

doi:10.1021/cm020707f

Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate

S.A. O'Neill, R.J.H. Clark, I.P. Parkin, N. Elliott, A. Mills

Pure And Applied Chemistry

Research output: Contribution to journal › Article › peer-review

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Abstract

Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to <5degrees on UV irradiation. The deposited films bring about the: complete photooxidation of a stearic acid overlayer following irradiation at 254 nm for 30 min. Both the drop in contact angle and the photooxidation described are critically important to the self-cleaning applications of anatase films on glass.

Original language	English
Pages (from-to)	46-50
Number of pages	4
Journal	Chemistry of Materials
Volume	15
Issue number	1
DOIs	https://doi.org/10.1021/cm020707f
Publication status	Published - 14 Jan 2003

Keywords

SEMICONDUCTOR PHOTOCATALYSIS
TIO2
GROWTH
WATER

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10.1021/cm020707f

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title = "Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate",

abstract = "Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to <5degrees on UV irradiation. The deposited films bring about the: complete photooxidation of a stearic acid overlayer following irradiation at 254 nm for 30 min. Both the drop in contact angle and the photooxidation described are critically important to the self-cleaning applications of anatase films on glass.",

keywords = "SEMICONDUCTOR PHOTOCATALYSIS, TIO2, GROWTH, WATER",

author = "S.A. O'Neill and R.J.H. Clark and I.P. Parkin and N. Elliott and A. Mills",

year = "2003",

month = jan,

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doi = "10.1021/cm020707f",

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journal = "Chemistry of Materials",

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TY - JOUR

T1 - Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate

AU - O'Neill, S.A.

AU - Clark, R.J.H.

AU - Parkin, I.P.

AU - Elliott, N.

AU - Mills, A.

PY - 2003/1/14

Y1 - 2003/1/14

N2 - Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to <5degrees on UV irradiation. The deposited films bring about the: complete photooxidation of a stearic acid overlayer following irradiation at 254 nm for 30 min. Both the drop in contact angle and the photooxidation described are critically important to the self-cleaning applications of anatase films on glass.

AB - Thin (50-500 nm) films of TiO2 may be deposited on glass substrates by the atmospheric pressure chemical vapor deposition (APCVD) reaction of TiCl4 with ethyl acetate at 400600 C. The TiO2 films are exclusively in the form of anatase, as established by Raman microscopy and glancing angle X-ray diffraction. X-ray photoelectron spectroscopy gave a 1:2 Ti:O ratio with Ti 2P(3/2) at 458.6 eV and O 1s is at 530.6 eV. The water droplet contact angle drops from 60degrees to <5degrees on UV irradiation. The deposited films bring about the: complete photooxidation of a stearic acid overlayer following irradiation at 254 nm for 30 min. Both the drop in contact angle and the photooxidation described are critically important to the self-cleaning applications of anatase films on glass.

KW - SEMICONDUCTOR PHOTOCATALYSIS

KW - TIO2

KW - GROWTH

KW - WATER

UR - http://pubs.acs.org/cgi-bin/article.cgi/cmatex/2003/15/i01/pdf/cm020707f.pdf

UR - http://dx.doi.org/10.1021/cm020707f

U2 - 10.1021/cm020707f

DO - 10.1021/cm020707f

M3 - Article

SN - 0897-4756

VL - 15

SP - 46

EP - 50

JO - Chemistry of Materials

JF - Chemistry of Materials

IS - 1

ER -

Anatase thin films on glass from the chemical vapor deposition of titanium(IV) chloride and ethyl acetate

Abstract

Keywords

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