Abstract
In this paper, the authors introduce and present some findings on an alternative non-contact material removal technique. Material removal is made possible by utilizing the electrokinetic and hydrodynamic effects of suspended particles to manipulate their trajectories to impact onto the surface of the workpiece. The research was previously demonstrated and reported where the removal rate can be precisely controlled by varying the electrical field and the flow rate of the slurry across the surface of the workpiece. New findings are reported on the application of the technique to different materials that will highlight the attractiveness of this alternative approach to Producing surface with roughnness in the order of nanometres
Original language | English |
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Title of host publication | Advanced Interconnects and Chemical Mechanical Planarization for Micro- and Nanoelectronics |
Place of Publication | Warrendale, Pa |
Pages | 141-146 |
Number of pages | 6 |
Volume | 1249 |
Publication status | Published - 5 Oct 2010 |
Externally published | Yes |
Event | 2010 MRS Spring Meeting - San Francisco, CA, United States Duration: 5 Apr 2010 → 9 Apr 2010 |
Conference
Conference | 2010 MRS Spring Meeting |
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Country/Territory | United States |
City | San Francisco, CA |
Period | 5/04/10 → 9/04/10 |
Keywords
- planarization techniques
- electrokinetics
- micromachining