STPS Multiplex ICP Etch System

Facility/equipment: Equipment

  • Technology and Innovation Centre

Description

Hass in-situ monitoring option with laser reflectometer. Process gases include chlorine, oxygen, hydrogen and argon.

Details

NameSTPS Multiplex ICP Etch System
Acquisition date25/06/13

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reflectometers
chlorine
argon
oxygen
hydrogen
gases
lasers