STPS LPX ICP Etch Syst c/w Reflectometer

Institute Of Photonics

Facility/equipment: Equipment

  • Technology and Innovation Centre

Description

Preferred ICP tool for running potentially contaminative processes. Process gases include chlorine, oxygen and argon.

Details

NameSTPS LPX ICP Etch Syst c/w Reflectometer
Acquisition date25/06/13

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argon
chlorine
oxygen
gas

Contact information

Emailsi.m.watson@strath.ac.uk
LinksWebsite