Equipments Details
Description
Preferred ICP tool for running potentially contaminative processes. Process gases include chlorine, oxygen and argon.
Details
Name | STPS LPX ICP Etch Syst c/w Reflectometer |
---|---|
Acquisition date | 25/06/13 |
Technology and Innovation Centre
Preferred ICP tool for running potentially contaminative processes. Process gases include chlorine, oxygen and argon.
Name | STPS LPX ICP Etch Syst c/w Reflectometer |
---|---|
Acquisition date | 25/06/13 |