Deposits silcon oxide from dilute silane and nitrous oxide, typically at ca 300 deg C. Also has an ammonia-free silicon nitride capability.
|Name||Oxford 80+PE-CVD tool w/b cracker furnac|
Chappell, G. (Creator), Guilhabert, B. J. E. (Contributor), Garcia, T. (Contributor), Zhao, K. (Contributor), Watson, I. (Contributor), Dawson, M. (Contributor), Tamargo, M. (Contributor) & Hastie, J. (Supervisor), University of Strathclyde, 11 Nov 2020