Equipments Details
Description
Deposits silcon oxide from dilute silane and nitrous oxide, typically at ca 300 deg C. Also has an ammonia-free silicon nitride capability.
Details
| Name | Oxford 80+PE-CVD tool w/b cracker furnac |
|---|---|
| Acquisition date | 27/06/13 |
Fingerprint
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Datasets
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Data for: "Suspension and transfer printing of ZnCdMgSe membranes from an InP substrate"
Chappell, G. (Creator), Guilhabert, B. J. E. (Contributor), Garcia, T. (Contributor), Zhao, K. (Contributor), Watson, I. (Contributor), Dawson, M. (Contributor), Tamargo, M. (Contributor) & Hastie, J. (Supervisor), University of Strathclyde, 11 Nov 2020
DOI: 10.15129/b3974689-3d7c-49d0-ab7a-c7fd7c1f1382
Dataset