Oxford 80+ RIE Etch Tool #1

Facility/equipment: Equipment

  • Technology and Innovation Centre

Description

Used for dielectric etching. Process gases include tetrafluoromethane, trifluoromethane, oxygen and argon.

Details

NameOxford 80+ RIE Etch Tool #1
Acquisition date25/06/13

Fingerprint

Reactive ion etching
Argon
Etching
Oxygen
Gases