Equipments Details
Description
Used for dielectric etching. Process gases include tetrafluoromethane, trifluoromethane, oxygen and argon.
Details
| Name | Oxford 80+ RIE Etch Tool #1 |
|---|---|
| Acquisition date | 25/06/13 |
Fingerprint
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Datasets
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Data for: "Suspension and transfer printing of ZnCdMgSe membranes from an InP substrate"
Chappell, G. (Creator), Guilhabert, B. J. E. (Contributor), Garcia, T. (Contributor), Zhao, K. (Contributor), Watson, I. (Contributor), Dawson, M. (Contributor), Tamargo, M. (Contributor) & Hastie, J. (Supervisor), University of Strathclyde, 11 Nov 2020
DOI: 10.15129/b3974689-3d7c-49d0-ab7a-c7fd7c1f1382
Dataset