Data for: "ReaxFF Molecular Dynamics Simulation Study of Nanoelectrode Lithography Oxidation Process on Silicon (100) Surface"

Description

MD simulation data includes chemical compositions, Oxide thickness, RDFs of oxide film, number of Oxygen atoms along the Z axis in the oxide film, Oxide thickness for the variation of efield, Oxide thickness for the variation of RH.

Date made available	29 Aug 2019
Publisher	University of Strathclyde
Date of data production	2019 -

Contact

[email protected]

DOI
10.15129/b5a4fdb7-ddc0-431a-a3c5-d2d9a28df99f

Access Dataset

Compositions_Efield02.xlsx
File: application/vnd.openxmlformats-officedocument.spreadsheetml.sheet, 26 KB
Type: Dataset
Licence: CC BY 4.0
Compostions_vs_Efield_variation.xlsx
File: application/vnd.openxmlformats-officedocument.spreadsheetml.sheet, 38.8 KB
Type: Dataset
Licence: CC BY 4.0
Oxide_thickness_Efield02.xlsx
File: application/vnd.openxmlformats-officedocument.spreadsheetml.sheet, 44.4 KB
Type: Dataset
Licence: CC BY 4.0
Oxide_thickness_vs_Efield_variation.xlsx
File: application/vnd.openxmlformats-officedocument.spreadsheetml.sheet, 61.6 KB
Type: Dataset
Licence: CC BY 4.0
RDF_Oxide_central_part.xlsx
File: application/vnd.openxmlformats-officedocument.spreadsheetml.sheet, 26.5 KB
Type: Dataset
Licence: CC BY 4.0
RDF_Oxidefilm.xlsx
File: application/vnd.openxmlformats-officedocument.spreadsheetml.sheet, 28.7 KB
Type: Dataset
Licence: CC BY 4.0
Oxide_growth_vs_RH.xlsx
File: application/vnd.openxmlformats-officedocument.spreadsheetml.sheet, 62.7 KB
Type: Dataset
Licence: CC BY 4.0
O_Atoms_vs_Z_Efield02.xlsx
File: application/vnd.openxmlformats-officedocument.spreadsheetml.sheet, 14.8 KB
Type: Dataset
Licence: CC BY 4.0

1 Article

ReaxFF molecular dynamics simulation study of nanoelectrode lithography oxidation process on silicon (100) surface
Hasan, R. M. M., Politano, O. & Luo, X., 1 Dec 2019, In: Applied Surface Science. 496, 143679.
Research output: Contribution to journal › Article › peer-review

Open Access
File
17 Citations (Scopus)

48 Downloads (Pure)

1 Finished

Micro-3D: Miniature Flexible & Reconfigurable Manufacturing System for 3D Micro-products
Luo, X. (Principal Investigator), Ion, W. (Co-investigator), Qin, Y. (Co-investigator), Jagadeesan, A. P. (Researcher) & Zeng, Q. (Researcher)
EPSRC (Engineering and Physical Sciences Research Council)
1/07/13 → 31/12/17
Project: Research

Cite this

Hasan, R. M. M. (Creator), Luo, X. (Supervisor) (29 Aug 2019). Data for: "ReaxFF Molecular Dynamics Simulation Study of Nanoelectrode Lithography Oxidation Process on Silicon (100) Surface". University of Strathclyde. Compositions_Efield02(.xlsx), Compostions_vs_Efield_variation(.xlsx), Oxide_thickness_Efield02(.xlsx), Oxide_thickness_vs_Efield_variation(.xlsx), RDF_Oxide_central_part(.xlsx), RDF_Oxidefilm(.xlsx), Oxide_growth_vs_RH(.xlsx), O_Atoms_vs_Z_Efield02(.xlsx). 10.15129/b5a4fdb7-ddc0-431a-a3c5-d2d9a28df99f

Data for: "ReaxFF Molecular Dynamics Simulation Study of Nanoelectrode Lithography Oxidation Process on Silicon (100) Surface"

Description

Contact

DOI

Access Dataset

Research output

ReaxFF molecular dynamics simulation study of nanoelectrode lithography oxidation process on silicon (100) surface

Projects

Micro-3D: Miniature Flexible & Reconfigurable Manufacturing System for 3D Micro-products

Cite this