Data for: "ReaxFF Molecular Dynamics Simulation Study of Nanoelectrode Lithography Oxidation Process on Silicon (100) Surface"

Dataset

Description

MD simulation data includes chemical compositions, Oxide thickness, RDFs of oxide film, number of Oxygen atoms along the Z axis in the oxide film, Oxide thickness for the variation of efield, Oxide thickness for the variation of RH.
Date made available29 Aug 2019
PublisherUniversity of Strathclyde
Date of data production2019 -

Cite this

Hasan, R. M. M. (Creator), Luo, X. (Supervisor). (29 Aug 2019). Data for: "ReaxFF Molecular Dynamics Simulation Study of Nanoelectrode Lithography Oxidation Process on Silicon (100) Surface". University of Strathclyde. Compositions_Efield02(.xlsx), Compostions_vs_Efield_variation(.xlsx), Oxide_thickness_Efield02(.xlsx), Oxide_thickness_vs_Efield_variation(.xlsx), RDF_Oxide_central_part(.xlsx), RDF_Oxidefilm(.xlsx), Oxide_growth_vs_RH(.xlsx), O_Atoms_vs_Z_Efield02(.xlsx). 10.15129/b5a4fdb7-ddc0-431a-a3c5-d2d9a28df99f